Formation mechanism and relative stability of the {1120} stacking fault atomic configurations in wurtzite (Al,Ga,In) nitrides
Identifieur interne : 001559 ( France/Analysis ); précédent : 001558; suivant : 001560Formation mechanism and relative stability of the {1120} stacking fault atomic configurations in wurtzite (Al,Ga,In) nitrides
Auteurs : RBID : Pascal:99-0282385Descripteurs français
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- concept : Céramique.
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Abstract
The formation of the {1210} stacking fault, which has two atomic configurations in wurtzite (Ga,Al,In)N, has been investigated by high-resolution electron microscopy and energetic calculations. It originates from steps at the SiC surface and it can form on a flat (0001) sapphire surface. A modified Stillinger-Weber potential is used in order to investigate the relative stability of the two atomic configurations which have comparable energy in AIN, whereas the 121011{1210} atomic configuration should be more stable in GaN and InN. Experimental evidence is shown in the case of AIN and GaN from high-resolution electron microscopy. Observations carried out in plan-view show the 121011{1210} atomic configuration in GaN layers. The 162023 configuration was found in small areas inside the AIN buffer layer in cross-section observations. It folds rapidly to the basal plane, and when back in the prismatic plane it bears the 121011{1210} atomic configuration.
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Pascal:99-0282385Le document en format XML
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<front><div type="abstract" xml:lang="en">The formation of the {1210} stacking fault, which has two atomic configurations in wurtzite (Ga,Al,In)N, has been investigated by high-resolution electron microscopy and energetic calculations. It originates from steps at the SiC surface and it can form on a flat (0001) sapphire surface. A modified Stillinger-Weber potential is used in order to investigate the relative stability of the two atomic configurations which have comparable energy in AIN, whereas the 121011{1210} atomic configuration should be more stable in GaN and InN. Experimental evidence is shown in the case of AIN and GaN from high-resolution electron microscopy. Observations carried out in plan-view show the 121011{1210} atomic configuration in GaN layers. The 162023 configuration was found in small areas inside the AIN buffer layer in cross-section observations. It folds rapidly to the basal plane, and when back in the prismatic plane it bears the 121011{1210} atomic configuration.</div>
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